Ion Beam Assisted Deposition
Ion Beam Assisted Deposition (IBAD) is a deposition technique that uses any deposition source to deposit the material onto a substrate which is bombarded by ions coming from an ion beam source. This process enables the deposition of metals, semiconductors, dielectrics, and ceramics. During IBAD process the material to be deposited vaporizes and then condenses onto the substrate surface. At the same time the thin film and the surface of the substrate are exposed to energetic ions emitted by the ion beam, causing the surface to undergo changes like densification, surface diffusion, and thin film nucleation. This technique can be used on more temperature-sensitive materials, such as plastics or polycarbonate lenses, since it can be performed at relatively low temperatures. The angle of the ion beam with the substrate is used to influence the roughness and texture of the film surface.
Ion Beam Assisted Deposition is a versatile thinfilm deposition technique widely utilized in the semiconductor, sensor industries to fabricate high-performance films with controlled properties
and top-quality optical coatings and in the medical industry for fabrication of metallic coatings
that are compatible with medical implants for biocompatibility or to create antimicrobial surfaces
Metals, Oxides, Nitrides, Carbides, Semiconductors, Carbon Based Materials
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