An Electron Beam system, from our PVD Series, with substrate rotation and tilt up to 25° was delivered for deposition of superconductive devices.

The Electron Beam Evaporation system featuring a turbo pumped process chamber with a 6-crucible 3kW electron beam source, substrate with rotation and tilt, a loadlock chamber with manual magnetic manipulator and heat treatment capability in an oxygen environment, has recently been delivered to Turku University in Finland. The Turku University is a world leader in fundamental research on properties of materials at extremely low temperatures in the mK range, and plans to use the electron beam evaporation system to deposit some of the layers needed for superconducting devices.