Electron Beam Deposition Systems

Electron Beam Deposition Systems
  • Electron beam evaporation is a well established technique extensively used both in industries and in research laboratories for the deposition of optical materials, metals and semiconductors. Single crucible and multicrucible electron beam sources with power supplies of 6, 10 and 15 kW maximum power are available. The use of multicrucible electron beam sources allows the deposition of multilayers of four or more materials; a quarz crystal thickness controller is used for programming multilayers as well as for the automatic control of the thickness and of the deposition rate in each layer.

    The system is normally equipped with a turbomolecular pump of suitable pumping speed to evacuate the chamber to the high vacuum or ultra high vacuum range. Substrates can be introduced in the process chamber via a front door or via an additional loadlock chamber.
    As an option, electron beam evaporation system can be equipped with an additional ion beam source for bombarding the substrates during deposition (Ion Beam Assisted Deposition - IBAD).

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